Atmospheric Chemistry and Physics Discussions www.atmos-chem-phys-discuss.net 1680-7367 1680-7375 3 2 2003 10.5194/acpd-3-1777-2003 http://www.atmos-chem-phys-discuss.net/3/1777/2003/ http://www.atmos-chem-phys-discuss.net/3/1777/2003/acpd-3-1777-2003.html http://www.atmos-chem-phys-discuss.net/3/1777/2003/acpd-3-1777-2003.pdf 1777 1804 2003-03-28 A revised parameterization for gaseous dry deposition in air-quality models L. Zhang J. R. Brook R. Vet Meteorological Service of Canada, 4905 Dufferin Street, Toronto, Ontario, M3H 5T4, Canada A parameterization scheme for calculating gaseous dry deposition velocities in air-quality models is revised based on recent study results on non-stomatal uptake of O₃ and SO₂ over 5 different vegetation types. Non-stomatal resistance, which includes in-canopy aerodynamic resistance, soil resistance and cuticle resistance, for SO₂ and  O₃ is parameterized as a function of friction velocity, relative humidity, leaf area index, and canopy wetness. Non-stomatal resistance for all other species is scaled to those of SO₂ and  O₃ based on their chemical and physical characteristics. Stomatal resistance is calculated using a leaf-stomatal-resistance model for all gaseous species of interest. The improvements in the present model compared to its earlier version include a newly developed non-stomatal resistance formulation, a realistic treatment of cuticle and ground resistance in winter and the handling of seasonally-dependent input parameters. Model evaluation shows that the revised parameterization can provide more realistic deposition velocities for both  O₃ and SO₂, especially for wet canopies. Example model output shows that the parameterization provides reasonable estimates of dry deposition velocities for different gaseous species, land types and diurnal and seasonal variations. Maximum deposition velocities from model output are close to reported measurement values for different land types. The current parameterization can be easily adopted into different air-quality models that require inclusion of dry deposition processes.